Revisions allow you to track differences between multiple versions of your content, and revert back to older versions.
The group "Allgemeine Elektrotechnik und Plasmatechnik" at the faculty for engineering and information science.
Processes at the plasma boundaries, including the electrodes, can significantly influence plasma properties, among them the plasma density, the flux-energy distribution of various particle species, etc. The emission of secondary electrons, in...
High-frequency technological low-temperature plasmas play a key role in various industrial processes of high societal relevance such as semiconductor manufacturing and gas conversion. Due to their complexity, the fundamentals of their operation...
An atmospheric pressure surface dielectric barrier discharge (SDBD) in helium-nitrogen mixtures is investigated experimentally using phase-resolved optical emission spectroscopy (PROES) and computationally employing a two-dimensional...
The effect of the shape of the applied voltage waveform on the energy efficiency of reactive species generation is investigated in an atmospheric pressure RF microplasma jet operated in a He/O$_2$ mixture (99.5\%/0.5\%) based on a one-dimensional...
Erosion of an aluminium oxide surface as well as a formation of an aluminium oxide coating on an aluminium substrate, comparable with erosion and oxide formation induced by plasma electrolytic oxidation (PEO), can be caused at atmospheric...
This is a .zip archive of all data and data processing scripts to generate the data-based plots in the paper "Mode transition induced by gas heating along the discharge channel in capacitively coupled atmospheric pressure micro plasma jets"....
A uniform atmospheric pressure dielectric barrier discharge is operated in helium with an admixture (0.45%) of nitrogen. The discharge is ignited in the gas gap between a driven and a grounded electrode and propagates along the dielectric surface...
This work utilizes 1d3v Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) simulations of a symmetric discharge in the low-pressure regime with the inclusion of realistic electron-surface interactions for silicon dioxide. A diagnostic framework is...
The kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a...
With the increasing demands towards large area plasma etching and deposition, the radial uniformity of capacitively coupled plasmas (CCPs) becomes one of the key factors that determine process performance in industrial applications. However,...
